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Two-Photon Continuous Flow Lithography

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ADVANCED MATERIALS, 24(10), 1304-1308. PO BOX 10 11 61, D-69451 WEINHEIM, GERMANY: WILEY-V C H VERLAG GMBH (2012) .

WILEY-V C H VERLAG GMBH

Full text: http://dx.doi.org/10.1002/adma.201103357

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Abstract

A new approach for microfluidics- based production of polymeric particles, namely two- photon continuous flow lithography, is reported. This technique takes advantage of two- photon lithography to create objects with sub- micrometer and 3D features, and overcomes the traditional process limitations of two- photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow- tie particles with sub- diffraction resolution and surface roughness as low as 10 nm are demonstrated.

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